NF3
SiH4
WF6
DCS
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SiH4

SiH4 is used in the manufacturing process of semiconductors, TFT-LCD and thin film solar cells. This is used to deposit silicon on wafer in semiconductors and to deposit silicon on TFT(thin film transistor) on top of glass substrate for TFT-LCD.

This gas  in expected to show increased demand with NF3 gas, following continued expansion of semiconductor, TFT-LCD and thin film sola cell lines.


 
  Specification Analyzer
Purity SiH₄ 99.9999%(excluding H₂)  
Impurity O₂+Ar <1.0 ppmv GC
N₂ <1.0 ppmv GC
H₂ <20.0 ppmv GC
CO <0.1 ppmv GC
CO₂ <0.1 ppmv GC
THC <0.1 ppmv GC
H₂O <1.0 ppmv Moisture Analyzer
 
  47ℓ Ton-cylinder 20ft ISO Container 40ft ISO Container
Filling 10Kg 100Kg 2,000Kg 4,000Kg
Container Material Mn-Steel Cr-Mo Steel
Valve JIS 22L, CGA632, CGA350
Shelf Life 1year
 
 
     
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